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Perovskite coating equipment

This device features a modular design compatible with both vapor-phase deposition (PVD) and liquid-phase spin-coating processes. It is equipped with 3-4 independent temperature-controlled evaporation sources to precisely regulate the sublimation rate of organic/inorganic precursors. An optional glove box interface enables operation in an oxygen-free environment. The sample stage is heated and rotatable, making it a core piece of equipment for the development of perovskite solar cells, LEDs, and detectors.

Details

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1. Overview of Equipment and Application Fields

The perovskite coating equipment is a vacuum preparation system specifically designed for third-generation photovoltaic materialsperovskite (Perovskite) and its related organic-inorganic hybrid thin films. Given the extreme sensitivity of perovskite materials to water and oxygen, and the fact that film quality directly determines the photoelectric conversion efficiency of devices, this equipment integrates high-precision multi-source thermal evaporation technology and solution spin-coating technology (optional). It enables "one-stop" continuous deposition from the electron transport layer, perovskite light-absorbing layer, to the hole transport layer and metal electrode under high vacuum or inert gas protection. This equipment is widely used in universities, research institutes, and new energy enterprises for core process development and small-scale prototyping of high-efficiency perovskite solar cells (PSCs), perovskite light-emitting diodes (PeLEDs), and radiation detectors.

2. Core Functional Highlights

· The multi-source independent precision temperature-controlled evaporation system is designed to address the distinct sublimation temperature characteristics of perovskite precursors (e.g., PbI, MAI, FAI) and transport layer materials (e.g., Spiro-OMeTAD, C₆₀). The system features 3 to 4 independent evaporation sources, each equipped with a high-precision PID temperature control module that covers a temperature range from room temperature to 450°C with an accuracy of ±0.5°C. It supports **co-evaporation** technology, enabling precise adjustment of the evaporation rate ratio between different sources to control the stoichiometric ratio of perovskite films, thereby achieving high-quality film formation with uniform composition and high crystallinity.

· High-precision multi-channel film thickness monitoring. The integrated imported multi-channel quartz crystal oscillator thickness gauge simultaneously monitors real-time deposition rates and cumulative thickness of multiple evaporation sources. The system features an automatic shutter linkage function that automatically closes the shutter when preset thickness or rate anomalies are detected, achieving control accuracy of 0.1A. This is critical for perovskite solar cells with functional layers only a few hundred nanometers thick, ensuring high repeatability of device performance.

· The flexible process compatibility (gas phase + liquid phase) equipment supports high-quality perovskite film preparation via full vacuum evaporation, with some models featuring spin coating interface or online integration with glove box spin coating systems. Users can adopt a hybrid process route: vacuum evaporation for transmission layer + glove box spin-coated perovskite layer + vacuum evaporation for electrodes, enabling adaptable implementation of various cutting-edge experimental protocols.

· Anhydrous Oxygen Environment and In-situ Annealing

o High vacuum assurance: Equipped with high-performance molecular pump units, achieving an ultimate vacuum level of 5×10⁻⁵ Pa to effectively remove residual water vapor and oxygen within the chamber.

o Online glove box system: The equipment flange interface can be directly connected to a standard glove box, enabling the full-process transfer and preparation of samples under an environment of **<0.1 ppm O/HO**, completely eliminating material oxidation and degradation.

o In-situ heating annealing: The sample stage features heating capability from room temperature to 200°C (or higher, depending on configuration), enabling in-situ annealing during or immediately after deposition to promote perovskite crystal growth and reduce defect state density.

· Intelligent Safety and User Experience: Equipped with a PLC touch screen control system, the interface intuitively displays key parameters such as vacuum level, source temperatures, deposition rate, and film thickness. The system features built-in water-cooling flow monitoring, overcurrent protection, and over-temperature alarm mechanisms. The unique anti-pollution baffle design and easy-to-clean chamber structure significantly reduce the risk of cross-contamination during material replacement and lower maintenance costs.

3. Technical Parameters and Specifications

Parameter item

qualification

vacuum chamber

Material: 304 stainless steel, with polished inner surface

Size: Φ350mm × 400mm (customizable)

Interface: Standard CF flange for glove box connection

vacuum performance

Extreme vacuum: 5×10⁻⁵ Pa

Working vacuum: 1×10⁻³ to 5×10⁻² Pa

Pressure rise rate: 0.5 Pa/h

evaporation source system

Number of groups: 3 or 4 independent evaporation sources

Type: Boat-type/坩埚-type (suitable for powder/granules)

Temperature control range: RT to 450°C (accuracy ±0.5°C)

Power: Single-source adjustable from 0 to 500W

film thickness monitoring

Type: Multi-channel Quartz Crystal Oscillator Thickness Gauge

Probe: Water-cooled high-sensitivity probe

Accuracy: Resolution 0.1 Å, rate control accuracy ±1%

sample holder system

Size: Supports 2-4 inch substrates or custom fixtures

Motion: Revolution/rotation (0-30 rpm), enhancing uniformity

Heating: Optional, RT to 200°C (accuracy ±1°C)

vacuum system

PRE-Stage: Two-stage rotary vane mechanical pump

High vacuum: Turbomolecular pump (vacuum speed 400 L/s)

Valve: High Vacuum Butterfly Valve/Blade Valve

navar

PLC + 7-inch/10-inch color touchscreen

Functions: Process formula storage, real-time curve recording, fault self-diagnosis

Power Supply and Cooling

Power supply: AC 220V/380V,50Hz

Cooling: Circulating water cooling system (pressure 0.2-0.4 MPa)

4. Typical Application Scenarios

· Perovskite Solar Cells (PSCs): Preparation of all-inorganic and organic-inorganic hybrid perovskite cells with n-i-p or p-i-n structures to optimize photoelectric conversion efficiency (PCE).

· Perovskite light-emitting diodes (PeLEDs): By precisely controlling the thickness and composition of the light-emitting layer, they achieve high-efficiency, high-purity electroluminescence.

· X-ray/gamma-ray detectors: deposition of large-area, low-defect-density perovskite single-crystal or polycrystalline thin films to enhance detection sensitivity.

· Advanced optoelectronic material screening: Rapidly validate device performance with varying precursor ratios and transmission layer materials to accelerate new material development.

· Multilayer heterojunction devices: The fabrication of complex heterojunction structures involving multiple organic/inorganic materials.

5. Why choose professional perovskite coating equipment?

Professional perovskite coating systems go beyond standard evaporation equipmentthey are the key to mastering the unique challenges of perovskite film formation. The multi-source co-evaporation technology addresses component control challenges, while the glove box integrated design overcomes water/oxygen sensitivity. In-situ annealing and precision monitoring ensure crystal quality consistency across devices. Choosing our system provides a complete solution from fundamental lab validation to high-efficiency device fabrication, empowering you to gain a competitive edge in the fast-evolving field of renewable energy and optoelectronics research, accelerating the production of cutting-edge scientific achievements.